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OSIS Photovoltaic Products
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A comprehensive metrology family that covers all
critical process steps of c-Si PV manufacturing
Our product family OSIS, or - Op-tection Solar Inspection Systems - is
available to inspect every process step, from wafer to ready module. All
machines are designed and optimized to measure inline. In addition,
efficient and precise stand-alone machines are available as well, for
offline testing and R&D work. The following overview lists the c-Si PV
process steps that OSIS metrology systems can be applied to
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Process Step: Incoming Wafers
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OSIS Wafer-PL-Sorter: Sorting of as-cut wafers based
on forecasted cell efficiency using Photo Luminescence imaging
OSIS Wafer-Micro-Crack: inline inspection system for solar wafers to find
micro-cracks, inclusions and to quantify grain properties
OSIS Wafer-Thickness: inline thickness measurement system for wafers applied
before saw damage removal
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OSIS Wafer-PL-Sorter
Sorting of as-cut wafers based on forecasted cell
efficiency using Photo Luminescence imaging
What if you could verify the potential of your as-cut
wafers and avoid investing money in wafers that will become low efficient
cells? Op-tection’s PL-based wafer sorters let you reliably verify the
efficiency potential of as-cut wafers before you further process them to
cells:
Save money by rejecting and not further processing bad wafers
Earn money by processing wafers with forecasted high efficiency accordingly
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Fields of Application
Our PL technology can be used for all types of solar
wafers. The strongest benefit of this capability however applies to:
Poly-Wafers: dislocation clusters, edge contamination fractions and
corner brick metrics are weighted and used for a precise forecast.
Pseudo-Mono-Wafers: this new generation of wafer material has some
distinct characteristics that require detailed investigation and efficiency
forecasting. The very small amount of grain boundaries make this type of
wafer look nearly like a single crystal from the outside. However,
dislocations are present in this material, and unlike regular poly-wafers,
there are just few grain boundaries. This can result in over-proportional
growth/presence of dislocations in pseudo-mono material, which strongly
impacts the achievable cell efficiency.
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Photo Luminescence
The wafer under test is illuminated with strong laser
light source to excite the luminescence response of the silicon. A sensitive
and high-resolution camera combined with adapted filters records the Photo
Luminescence (PL) image. This 2D image is a measure for the spatially
resolved carrier lifetime of the silicon.
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Wafer Sorting
Wafer Sorting
The OSIS-Sorter-PL is a fully-automatic box to box as-cut wafer sorter. User
defined sorting parameters based on forecasted efficiency allow binning in
multiple classes:
Reject bad, not processable wafers
Separate high efficient / premium wafers to process them accordingly
Regular processing for standard wafers
The sorter is available in various configurations to match your production
throughput.
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OSIS Wafer-Micro-Crack:
Inline and on-the-fly micro-crack and defect
inspection of solar wafers
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FACT: The production of solar cells with the highest
efficiency starts with flawless wafers. Precise incoming inspection is a key
step to select and use such premium wafers.
OSIS Wafer distinguishes itself from other optical wafer inspection systems
by offering essential and unique capabilities. Premium optical components
used in a proprietary transmission optical setup enable detection of
defects, such as micro-cracks in the bulk silicon. Furthermore the wafers
can be inspected completely to the edge. As OSIS Wafer measures on-the-fly,
high line speed and throughput are guaranteed.
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OSIS Wafer is an ideal system to be integrated into the
OSIS Sorting system. When configured as wafer sorter, the system is a great
asset as incoming wafer inspection for cell producers.
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The user software unites various useful functions. First
of all a large image of the scanned wafer is displayed. When activated the
software marks found cracks, inclusions and further defects with colored
circles. Based on user-selected quality standards, the wafer becomes a
quality category, which is used to create production statistics and yield
calculations. The full size image is also accessible by the user for
detailed analysis of defect cause(s).
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OSIS Wafer Thickness
Non-contact inline measurement of wafer thickness
High solar cell efficiency requires good and consistent wafer texture
quality. The material removal rate is an important parameter to control the
texturing as well as saw damage removal.
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Unlike differential weighing methods, OSIS Wafer
Thickness enables exact measurement of the material removal rate, without
the need of correlations or assumptions. Typically one sensor is installed
before the SDR/Texturing process. A second sensor measures the wafer
thickness directly after, resulting in the material removal rate as
thickness difference.
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100% inline measurement of the material removal allows
accurate prediction of the chemical bath life time. This helps to use the
baths more efficient and save on disposal costs. In addition, the amount of
material removed correlates well to the wafer reflectivity that is measured
with OSIS Texture.
OSIS Wafer Thickness is a non-contact interferometric measurement, hence no
additional wafer handling or contacting is needed. With its 100 Hz
measurement rate, complete wafer profiles are available quickly.
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The measurement itself work reliably on both mono- and
poly-wafers. Faulty readings are impossible as the measurement signal is
either present, or not at all. The "hit-rate" on both wafer types is >90% so
that dense data for each wafer is collected.
Presentation example: (left) Trend chart of wafer thickness after SDR with
min/man/ave; (right) Thickness profile of an individual wafer
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Process Step: Saw Damage Removal and Texturing
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OSIS Texture
Inline measurement of wafer reflectivity after saw
damage removal / texturing for direct process control
High solar cell efficiency requires good and consistent wafer texture
quality. Random offline measurement, such as weighing before and after
etching, is labor intensive and only reveals process drifts with a large
time-delay.
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OSIS Texture immediately shows the reflection drift, when
for example, the concentration or temperature of the acid bath changes. This
allows you to directly take counter measures, which results in consistent
texture quality and low reflection for all wafers that you produce. It also
enables for example more effective bath activation. On top of that labor for
tedious offline measurements is eliminated. OSIS Wafer Thickness is an
additional powerful instrument to measure the exact material removal and
work well in tandem with OSIS Texture.
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OSIS Texture consists of proprietary optical probe which
is connected to a spectrometer system via fiber optic cables. The optical
probe is optimized to precisely measure the reflected and scattered light
from the textured surface of the wafer. In addition an integrated optical
filter avoids disturbing ambient light from interfering with the
measurement. The size of the optical probe is extremely small compared to
for example integrating spheres. This enables convenient mounting between
the feed rolls of a line track.
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The operation software provides comprehensive
reflectivity statistics and trends from wafer to wafer as well as the
complete batch to enable immediate intervention in case of process drifts.
As the software also has an automatic wafer detection function, no
additional hardware or sensors to detect the wafer position have to be used.
This makes retrofitting of the system in existing production lines very
simple.
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Process Step: Anti-Reflection Coating and Passivation
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OSIS Coating: high resolution measurement of
thickness and refractive index of SiNx for batch coating process control and
R&D
OSIS Coating-Inline: high resolution measurement of thickness and
refractive index of SiNx for process ramp-up and control
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OSIS Coating
Fast and high resolution mapping of layer thickness
and refractive index of silicon nitride (SiNx) anti-reflection coating
OSIS Coating is a very fast and precise measurement system for layer
thickness and refractive index distribution measurement of Silicon Nitride
Anti-Reflection Coating. It measures directly on textured production wafers.
Fast and accurate hardware in combination with self explanatory software,
touch screen operation, and a fast loading mechanism allow unequaled speed
and user comfort.
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The stand-alone version of OSIS Coating +n perfectly
complements its inline counterpart. Production wafers that need further
investigation after the deposition process, are measured precisely and fast.
Equally important, OSIS Coating enables you to research coating behavior in
more detail within just a fraction of the time compared to conventional
metrology tools.
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Operation of OSIS Coating is very straight-forward and self explanatory.
After just a very short time your the user is comfortable operating the
system. Important in particular is the speed with which you have access to
the measurement data:
1) load the wafer on the tray
2) select the scan resolution
3) start the scan
4) wafer is unloaded and storage of measurement result
5) print a report
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In Fast Scan Mode, OSIS Coating +n provides you
with a meaningful distribution map of 100x100 thickness measurements and 100
refractive index measurements in less than 10 seconds.
Operating in High-Res Mode, you will obtain rich data, which unveils
the detailed deposition topography of your silicon nitride coated wafers. In
under one minute, distribution maps of 400x400 thickness measurements and
400 refractive index measurements are available
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OSIS Coating Inline
Fast and high resolution inline measurement of layer
thickness and refractive index of silicon nitride (SiNx) anti-reflection
coatin
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Measurement directly on textured wafers
helps to avoid preparation of special polished wafers.
Apart from lower labor expenses, measuring directly on the real production
wafers has an additional benefit: the indirect correlation between the
measurement on polished reference wafers and the actual textured production
wafers becomes obsolet
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Higher line up-time
is another important capability that is obtained. Access
to thickness and refractive index trends of every produced wafer will enable
you to make optimum use of your plasma or sputtering targets. After periodic
coater cleaning and maintenance you will be able to reach your process
window more quickly as the required control readings are available directly
after the first coated wafer. On an annual basis, this time gain will allow
you to produce considerably more wafers.
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Full surface measurement
of layer thickness at up to 100x20 points as well as
refractive index measurement of up to 20 points on each wafer provide
unequaled real-time information about the SiNx AR coating process
Presentation example: Thickness and refractive index trend data for a single
cell handled setup. Each wafer is also presented as 2D map incl. thickness
histogram.
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Process Step: Screen Printing
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OSIS Cell-EL-ac: cell electro luminescence with
automatic cell contacting mechanism that is used for random testing and
small batch testing
OSIS Cell-EL-mc: cell electro luminescence with manual cell contacting
mechanism that is used for R&D and random testing
OSIS Cell-Sorter: full automatic solar cell tester/sorter platform, with
optical and electrical cell testing capabilities for testing of incoming
cells in module factories
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OSIS Cell ac

Flexible stand-alone system for quick batch testing of
solar cells using electro luminescence imaging.
FACT: The performance of any solar module is depending on the weakest cell
in the assembly. Wet-chemical processing, coating, and screen printing can
cause strong tension, resulting in silicon bulk defects that are not visible
on the outside of the cell. Even if the IV-test shows the efficiency is high
enough right now, micro cracks, shunts and edge isolation imperfections have
long-term effects and can cause a dead cell in your module over time.
OSIS Cell utilizes electro luminescence imaging to perform the ultimate
check of the cell's integrity. The OSIS Cell version with automatic
contacting is available as stand-alone, table-top system for small batch
testing.
Cells are loaded onto a transport belt on one side of the system. Upon start
of measurement the cell is transported automatically into the dark exposure
chamber. The cells' busbars are gently contacted, after which voltage is
applied. After recording the EL image the cell is transported to the other
side of the system.
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OSIS Cell mc
Flexible stand-alone system for comfortable and quick
testing of different solar cell types using electro luminescence imaging.
FACT: The performance of any solar module is depending on the weakest cell
in the assembly. Wet-chemical processing, coating, and screen printing can
cause strong tension, resulting in silicon bulk defects that are not visible
on the outside of the cell. Even if the IV-test shows the efficiency is high
enough right now, micro cracks, shunts and edge isolation imperfections have
long-term effects and can cause a dead cell in your module over time.
OSIS Cell utilizes electro luminescence imaging to perform the ultimate
check of the cell's integrity. The OSIS Cell version with automatic
contacting is available as stand-alone, table-top system for small batch
testing.
Cells are loaded by hand into the systems' manual contacting frame. Upon
start of measurement voltage is applied. After recording the EL image the
cell is removed by hand.
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OSIS Cell Sorter
Full automatic solar cell tester/sorter platform, with
optical and electrical cell testing capabilities
The OSIS Cell Sorter platform is designed to allow solar module makers to
verify the integrity of the solar cells before they are processed to
modules. Such testing pays off quickly and can avoid unnecessary labor and
production cost, as well as module warranty claims. The tester/sorter
enables you to:
- Find cells with micro-cracks that will impact the module during tabbing,
stringing and the lamination process
- Verify if the cells meet the specified (and paid) efficiency
- Re-bin the cells in smaller efficiency classes to avoid power losses in
the module
- Find printing and cosmetical defects on the cells
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Process Step: Lamination
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OSIS Module-A: stand-alone inspection system for
laminated solar modules, based on electro luminescence imaging
OSIS Module-C / -D: stand-alone inspection system for laminated solar
modules, based on electro luminescence imaging
OSIS Module-F: Electro Luminescence inspection system for solar
modules for integration in a module flasher tunnel or a darkroom
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OSIS Module A
Stand-alone inspection system for laminated solar
modules, based on electro luminescence imaging
Uniting over 50 cells into one solar module is without any doubt the
production step with most value at stake because a single faulty cell or a
processing error can jeopardize the complete module. Electro luminescence is
a powerful and reliable way to verify the integrity of your solar modules
during production and before entering the market.
The OSIS Module A inspection system is used after lamination of the module
and is very valuable to inspect those modules that for example were
classified as a low quality grade by the IV-tester. The EL image of the
complete module and of individual cells, will enable you to pinpoint the
cause of low quality and take countermeasures.
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OSIS Module-C / -D
Stand-alone dual camera inspection system for
laminated solar modules, based on electro luminescence imaging.
Uniting over 50 cells into one solar module is without any doubt the
production step with most value at stake because a single faulty cell or a
processing error can jeopardize the complete module. Electro luminescence is
a powerful and reliable way to verify the integrity of your solar modules
during production and before entering the market.
The OSIS Module C inspection system is used after lamination of the module
and is very valuable to inspect those modules that for example were
classified as a low quality grade by the IV-tester. The EL image of the
complete module and of individual cells, will enable you to pinpoint the
cause of low quality and take countermeasures.
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OSIS Module-F (Flasher)
Electro Luminescence inspection system for solar
modules for integration in a module flasher tunnel or a darkroomThe
OSIS-Module-F is an electro luminescence inspection system that inspects
solar modules inside a module flasher or a dark room. The system
automatically searches for module defect(s), such as dark areas and low
efficiency areas in the cells of the module. Depending on the selected
camera resolution, cracks in the cells are detected as well. The system is
particularly useful as “last check” of the module integrity in the
downstream of the module line.
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