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TuiLaser
Introducing
new PLD UV-Laser TuiLaser introduces a high sophisticated UV light laser for
Pulsed Laser Deposition (PLD).
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Najad
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Photo
TuiLaser
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Pulsed
Laser Deposition (PLD) is an extremely versatile
technique used for the deposition of thin films.
Complex multilayer films are created by the simple
interchange of the targets during the deposition cycle
by a multi-target manipulator. the outstanding
advantage of this technique being the possible growth
of multi-component films. Today, TuiLaser provides a
user-friendly excimer laser enabling rapid ablate and
deposit of metal oxides and other materials. The achieved
design ensuring highly uniform and reproducible film
properties for ferroelectric, piezoelectric and smart
materials.
While
increasing the functionality of the PLD for Ultra High
Vacuum (UHV) systems and focusing on the properties of
the laser source creating unique plasma, TuiLaser made
a new approach toward the deployment of new excimer
laser technologies. The first result being the
development of the ThinFilmStar laser system offering
low divergence, small aperture area and an extremely
fast rise-time leading to high power. Combined with
high focusability, this results in high intensities
and thus homogeneous ablation. Compared to
conventional excimer laser sources only increasing the
pulsed energy, this UV laser source achieves the same
goal through decreased plasma shielding. The
ThinFilmStar using that way less energy as
conventional lasers to obtain a homogeneous ablation
plume.
Article Reference :
002067
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LASER
TECHNOLOGY NEWS 
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