Introducing new PLD UV-Laser

TuiLaser introduces a high sophisticated UV light laser for Pulsed Laser Deposition (PLD).

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Pulsed Laser Deposition (PLD) is an extremely versatile technique used for the deposition of thin films. Complex multilayer films are created by the simple interchange of the targets during the deposition cycle by a multi-target manipulator. the outstanding advantage of this technique being the possible growth of multi-component films. Today, TuiLaser provides a user-friendly excimer laser enabling rapid ablate and deposit of metal oxides and other materials. The achieved design ensuring highly uniform and reproducible film properties for ferroelectric, piezoelectric and smart materials.

While increasing the functionality of the PLD for Ultra High Vacuum (UHV) systems and focusing on the properties of the laser source creating unique plasma, TuiLaser made a new approach toward the deployment of new excimer laser technologies. The first result being the development of the ThinFilmStar laser system offering low divergence, small aperture area and an extremely fast rise-time leading to high power. Combined with high focusability, this results in high intensities and thus homogeneous ablation. Compared to conventional excimer laser sources only increasing the pulsed energy, this UV laser source achieves the same goal through decreased plasma shielding. The ThinFilmStar using that way less energy as conventional lasers to obtain a homogeneous ablation plume.

Article Reference : 002067