FHR Anlagenbau GmbH in Ottendorf-Okrilla near Dresden (Saxonia) was founded in 1991 by a group of engineers with long years of experience in the field of vacuum and thin film technologies. The company had a fast growing development during the first years of business and moved into new business facilities end of 1993. Because of the continuous fast growing development the company moved again into new larger business facilities begin of 2000.
Today the company is working in the field of high-rate sputtering for microelectronics and other applications with customers amongst research institutes and industry.
A wide scale of state of the art equipment like in-line systems and cluster tools is available now.
Innovative developments are in the field of new plasma deposition and etching technologies, new sources and in the field of cleaning and stripping processes.