LC60Dx single line scanner brings laser scanning in the accuracy range of tactile measurement, while capturing 75,000 measurement points a second. Equipped with powerful CMOS technology, the all-digital scanner automatically digitizes the complete geometry of parts covering features and surfaces in just a few CMM strokes.
Focus Handheld is the driver software for Nikon Metrology laser scanner integrations on Optical CMMs and Articulated arms CMMs. It acquires and preprocesses the raw point cloud data and seamlessly integrates with with Focus Inspection and Automation. Focus Scan Handheld is also available as an API library to integrate with 3rd party inspection software, such as PolyWorks, Rapidform, Geomagic, etc.
LK CMMs: So much more
The Nikon Metrology LK range of Coordinate Measuring Machines represent the ultimate in CMM technology. Designed and manufactured using only the highest quality materials, they carry a heritage of over 45 years experience and expertise. LK CMM s deliver the ability to perform dimensional, positional and surface measurement in a single system. Combined with a complete range of contact and non-contact sensors, Nikon Metrology CMM s provide true multi-sensor capability. Sensors can be quickly changed to combine geometric and surface measurement into a single inspection routine.
The XT H 225/320 LC features a more powerful microfocus X-ray source that is able to run highly accurate inspection on dense industrial objects. Nikon Metrology is the only company to produce 320kV microfocus X-ray sources. As the X-ray spot size of these sources is orders of magnitude smaller compared to minifocus sources, end users benefit from superior resolution, accuracy and a wider array of measurable parts.
Nikon's Confocal NEXIV VMR-K3040ZC addresses the metrology needs of complex IC packages resulting from the enormous demand for reliable semiconductor products. The Confocal NEXIV features a new optical measuring head using confocal capabilities to solve the problem of Z-series measurement. This head supports a micron-level measuring capability, and has been optimized for semiconductor measuring by stressing low distortion to optimize the entire field of view.